Hsiang Ning Wu

Title: Hsiang Ning Wu: Innovator in High Reflectivity Aluminum Layers

Introduction

Hsiang Ning Wu is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of materials science, particularly in the development of methods and apparatus for enhancing the reflectivity of aluminum layers.

Latest Patents

Hsiang Ning Wu holds 1 patent for his innovative work titled "Methods and apparatus for high reflectivity aluminum layers." This patent details a method for increasing the reflectivity of an aluminum layer on a substrate. The process involves depositing a layer of cobalt or cobalt alloy, or a layer of titanium or titanium alloy on the substrate using a chemical vapor deposition (CVD) process. Additionally, it includes pre-treating the cobalt layer with a thermal hydrogen anneal at approximately 400 degrees Celsius if the top surface is compromised. The aluminum layer is then deposited at around 120 degrees Celsius, with pre-treatment lasting between 60 to 120 seconds.

Career Highlights

Hsiang Ning Wu is currently employed at Applied Materials, Inc., where he continues to push the boundaries of innovation in materials technology. His work has implications for various applications, particularly in the semiconductor and electronics industries.

Collaborations

Hsiang has collaborated with several talented individuals, including Jacqueline S Wrench and Liqi Wu, who contribute to the innovative environment at Applied Materials, Inc.

Conclusion

Hsiang Ning Wu's contributions to the field of high reflectivity aluminum layers exemplify the spirit of innovation. His patent reflects a commitment to advancing technology in materials science, showcasing the importance of collaboration and creativity in driving progress.