This inventor holds 1 USPTO granted patent. Top assignee: Dai Nippon Insatsu Kabushiki Kaisha. Active years: 1985.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1985
Title: Hozumi Tanaka: Innovator in Ionizing Radiation Lithography
Introduction
Hozumi Tanaka is a notable inventor based in Funabashi, Japan. She has made significant contributions to the field of materials science, particularly in the development of advanced resist materials for lithography.
Latest Patents
Tanaka holds a patent for a negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation. This innovative material has a molecular weight ranging from 10,000 to 1,000,000 and is represented by a specific chemical formula. The resist exhibits excellent characteristics such as high sensitivity, high resolving power, and outstanding dry etching resistance, making it suitable for use in ionizing radiation lithography.
Career Highlights
Throughout her career, Hozumi Tanaka has been associated with Dai Nippon Insatsu Kabushiki Kaisha, where she has played a pivotal role in advancing lithographic technologies. Her work has been instrumental in enhancing the performance of resist materials used in various applications.
Collaborations
Tanaka has collaborated with several talented individuals in her field, including Naoya Ogata and Kohei Sanui. These collaborations have contributed to the development of innovative solutions in lithography.
Conclusion
Hozumi Tanaka's contributions to the field of ionizing radiation lithography through her patented innovations highlight her role as a leading inventor. Her work continues to influence advancements in materials science and technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile