Company Filing History:
Years Active: 1991-1997
Title: Howland D Jones: Innovator in Infrared Spectroscopy and Silicon Technology
Introduction
Howland D Jones is a notable inventor based in Albuquerque, NM (US). He has made significant contributions to the fields of infrared spectroscopy and silicon technology. With a total of 2 patents, his work has advanced the understanding and application of these technologies in various scientific domains.
Latest Patents
One of his latest patents is titled "Multivariate classification of infrared spectra of cell and tissue." This patent applies multivariate classification techniques to spectra from cell and tissue samples irradiated with infrared radiation. The goal is to determine whether the samples are normal or abnormal, such as cancerous. This method utilizes mid and near-infrared radiation for both in vivo and in vitro classifications across different wavelengths.
Another significant patent is the "Electrochemical method for defect delineation in silicon-on-insulator." This invention describes an electrochemical approach for identifying defects in thin-film silicon-on-insulator (SOI) or silicon-on-sapphire (SOS) wafers. The method involves electrically connecting the surface of a silicon wafer to control its voltage within a specified range. After contacting the wafer with an electrolyte and subsequently removing it, defects and metal contamination in the silicon wafer can be identified.
Career Highlights
Throughout his career, Howland D Jones has worked with prominent organizations, including Sandia Corporation and the United States of America as represented by the Department of Energy. His work in these institutions has allowed him to contribute to groundbreaking research and development in his fields of expertise.
Collaborations
Some of his notable coworkers include David M Haaland and Edward V Thomas. Their collaborative efforts have further enriched the research and innovations in which they have been involved.
Conclusion
Howland D Jones is a distinguished inventor whose work in infrared spectroscopy and silicon technology has made a lasting impact. His patents reflect his commitment to advancing scientific knowledge and practical applications in these critical areas.