Howard Shillingford

Title: Howard Shillingford: Innovator in Semiconductor Technology

Introduction

Howard Shillingford is a notable inventor based in Poughkeepsie, NY (US). He has made significant contributions to the field of semiconductor technology, particularly in the area of dielectric films. His innovative work has led to the development of a patented process that addresses critical challenges in the industry.

Latest Patents

Howard Shillingford holds a patent for the "Reduction of cracking in low-k spin-on dielectric films." This invention relates to a process that minimizes the cracking of low-k dielectric polymers. In an example embodiment, the method involves forming a composite dielectric on a semiconductor substrate. The process includes depositing a first layer of spin-on dielectric on a metal layer, followed by a thin stress relief layer, and then a second layer of spin-on dielectric. The low-k spin-on dielectrics may include hydrogen silsequioxane (HSQ) and methyl silsequioxane (MSQ).

Career Highlights

Howard Shillingford is currently associated with NXP B.V., a company known for its advancements in semiconductor technology. His work at NXP B.V. has allowed him to focus on innovative solutions that enhance the performance and reliability of semiconductor devices.

Collaborations

Throughout his career, Howard has collaborated with esteemed colleagues, including Harbans S Sachdev and Garkay Joseph Leung. These collaborations have contributed to the advancement of technology in the semiconductor field.

Conclusion

Howard Shillingford's contributions to semiconductor technology through his innovative patent demonstrate his commitment to addressing industry challenges. His work continues to influence the development of advanced materials in the field.