Shanghai, China

Howard Li

This inventor holds 1 USPTO granted patent. Top assignee: At&s (China) Co. Ltd.. Active years: 2021.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Howard Li. Retrieved from https://idiyas.com/inventor/howard-li-nrw4y6pg

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Howard Li

Introduction: Howard Li is a prominent inventor based in Shanghai, China. With one patented innovation to his name, he has made significant contributions in the field of component carrier technology, demonstrating the potential of advanced dielectric structures in electronic applications.

Latest Patents: Howard Li holds a patent for a "Component carrier comprising dielectric structures with different physical properties." This innovative component carrier features a stack that includes at least one electrically conductive layer structure and multiple electrically insulating layer structures. Notably, the electrically insulating layer structures consist of a first dielectric structure and a second dielectric structure, which differ concerning at least one physical property. This design aims to enhance the integration and efficiency of electronic components.

Career Highlights: Howard is affiliated with AT&S (China) Co. Ltd., a leading company in the field of technology and electronic manufacturing. His work at AT&S signifies his role in advancing manufacturing processes and enhancing component effectiveness.

Collaborations: Throughout his career, Howard has collaborated with notable colleagues like Kim Liu and Nick Xin, leveraging their expertise to foster innovation and address complex challenges in technology development.

Conclusion: As an inventor, Howard Li represents the spirit of innovation, particularly within the electronics industry. His patented work in dielectric structures not only exemplifies his commitment to advancing technology but also highlights the importance of collaboration in achieving groundbreaking inventions. The impact of his contributions will likely resonate within the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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