This inventor holds 1 USPTO granted patent. Top assignees: Xi'an Eswin Material Technology Co., Ltd., Xi'an Eswin Silicon Wafer Technology Co., Ltd.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
1 out of 14 
1 out of 9 Years Active: 2024
Title: Housheng Li: Innovator in Wafer Technology
Introduction
Housheng Li is a notable inventor based in Xi'an, China. He has made significant contributions to the field of wafer technology, particularly in the area of positioning methods for V-type notches.
Latest Patents
Housheng Li holds a patent for a "Method and system for positioning center of V-type notch of wafer, and computer storage medium." This innovative method involves determining the center of a concentric circle corresponding to the edges of a V-type notch based on collected edge data. It also includes assessing the position relation between the center and a reference scale line to determine if the notch is at a target center position. Furthermore, the method outlines how to adjust the wafer's rotation direction and angle when the notch is misaligned, ensuring precise positioning.
Career Highlights
Throughout his career, Housheng Li has worked with prominent companies such as Xi'an Eswin Material Technology Co., Ltd. and Xi'an Eswin Silicon Wafer Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to advancements in wafer technology.
Collaborations
Housheng Li has collaborated with talented individuals in his field, including Leilei Wang and Xun Lan. These partnerships have fostered innovation and have been instrumental in the development of new technologies.
Conclusion
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Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile