Santa Clara, CA, United States of America

Hossein Rezvantalab

This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hossein Rezvantalab. Retrieved from https://idiyas.com/inventor/hossein-rezvantalab

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Hossein Rezvantalab: Semiconductor Processing Innovation

Introduction

Hossein Rezvantalab is an inventor based in Santa Clara, California, and works at Applied Materials, Inc. His patent work focuses on semiconductor processing equipment and gas delivery systems.

Latest Patents

Rezvantalab is associated with 1 patent, titled “Semiconductor Processing System with a Manifold for Equal Splitting and Common Divert Architecture.” The invention describes a substrate processing system with a lid plate and a gas splitter seated on it. The splitter uses separate inlets, lumens, and outlets to route gases, alongside mixing channels that connect to output manifolds through weldments. This architecture is designed to support gas distribution and mixing within semiconductor processing equipment.

Career Highlights

His listed patent reflects work on the design of gas-routing components for semiconductor manufacturing systems. At Applied Materials, Inc., this invention is connected to equipment used in substrate processing.

Collaborations

The provided information lists Vinay K. Prabhakar and Arun Chakravarthy as Rezvantalab’s coworkers. Their inclusion indicates professional connections within the semiconductor technology field, though specific collaboration on this patent is not established by the supplied details.

Conclusion

Hossein Rezvantalab’s patent highlights an engineering contribution to semiconductor processing, particularly the routing and distribution of gases through a manifold-based system.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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