Uijeongbu, South Korea

Hoseung Jeon

This inventor holds 1 USPTO granted patent. Top assignee: Korea Advanced Institute of Science and Technology. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoseung Jeon. Retrieved from https://idiyas.com/inventor/hoseung-jeon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2018

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1 patent (USPTO):Explore Patents

Title: Hoseung Jeon: Innovator in Semiconductor Device Manufacturing

Introduction

Hoseung Jeon is a prominent inventor based in Uijeongbu, South Korea. He has made significant contributions to the field of semiconductor technology. His innovative work focuses on methods that enhance the efficiency and cost-effectiveness of semiconductor device manufacturing.

Latest Patents

Hoseung Jeon holds a patent for a semiconductor device manufacturing method. This invention aims to lower the technical difficulties associated with forming horizontal single crystal nanowires. The method includes several steps, such as preparing a substrate with designated areas, determining the position for nanowire formation, and facilitating selective single crystal growth. The process ultimately leads to the formation of a nanowire through a self-aligned method, significantly reducing manufacturing costs.

Career Highlights

Hoseung Jeon is affiliated with the Korea Advanced Institute of Science and Technology. His work has been instrumental in advancing semiconductor manufacturing techniques. He has demonstrated a commitment to innovation and excellence in his field.

Collaborations

Hoseung Jeon has collaborated with notable colleagues, including Jeoungwoo Kim and Wangyu Lee. Their combined expertise contributes to the advancement of semiconductor technologies.

Conclusion

Hoseung Jeon is a key figure in semiconductor device innovation, with a focus on improving manufacturing processes. His contributions are paving the way for more efficient and cost-effective semiconductor technologies.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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