Gyeonggi-do, South Korea

Hoseok Shin

This inventor holds 2 USPTO granted patents. Top assignee: Hl Klemove Corp.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoseok Shin. Retrieved from https://idiyas.com/inventor/hoseok-shin-royncsw6

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 6.0


Company Filing History:


Years Active: 2026

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2 patents (USPTO):Explore Patents

Title: Hoseok Shin: Innovator in Spatial Division Structures

Introduction

Hoseok Shin is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of optical devices, particularly through his innovative patent related to spatial division structures.

Latest Patents

Hoseok Shin holds a patent for a "Spatial division structure and light reflection device and lidar scanning system having same." This invention discloses a spatial division structure designed to divide a reflective surface of a rotary reflection structure, which is configured to reflect light. The structure includes a blocking plate with an insertion space for the rotary reflection structure, effectively dividing the reflective surface into two distinct reflective surfaces. This innovative design enhances the functionality of light reflection devices.

Career Highlights

Hoseok Shin is currently associated with Hl Klemove Corp., where he continues to develop cutting-edge technologies. His work focuses on improving optical systems and enhancing their applications in various fields.

Collaborations

Hoseok collaborates with talented coworkers, including Yun Ki Han and Hakgu Han, who contribute to the innovative environment at Hl Klemove Corp.

Conclusion

Hoseok Shin's contributions to the field of spatial division structures exemplify his commitment to innovation and technology. His patent reflects a significant advancement in light reflection devices, showcasing his expertise and dedication to the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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