Location History:
- Bunkyo-ku, JP (2001)
- Tokyo, JP (2011)
Company Filing History:
Years Active: 2001-2011
Title: Hosei Nakahira: Innovator in CMP Polishing Technology
Introduction
Hosei Nakahira is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in chemical mechanical polishing (CMP) technology. With a total of 2 patents, Nakahira's work has advanced the reliability and efficiency of polishing processes in semiconductor fabrication.
Latest Patents
Nakahira's latest patents include a method for detecting the polishing endpoint in CMP polishing devices and a flatness measuring apparatus. The first patent outlines a method that utilizes the spectral reflectance spectrum of a polishing object to determine when the polishing endpoint has been reached. By analyzing the correlation coefficient and the absolute values of the first order differentials, this method provides a highly reliable means of detecting the polishing endpoint in CMP polishing apparatuses. The second patent describes a flatness measuring apparatus that assesses the flatness of a substrate by adjusting focus based on height data from specific measuring points. This apparatus includes an arithmetic operation device that calculates displacement quantities to measure the substrate's flatness accurately.
Career Highlights
Hosei Nakahira is currently employed at Nikon Corporation, a leading company in imaging and optical products. His work at Nikon has allowed him to focus on innovations that enhance semiconductor manufacturing processes. His expertise in CMP technology has positioned him as a key figure in the industry.
Collaborations
Nakahira has collaborated with notable coworkers, including Masahiko Yomoto and Eiji Matsukawa. Their combined efforts have contributed to advancements in the field of semiconductor technology.
Conclusion
Hosei Nakahira's contributions to CMP polishing technology and his innovative patents have significantly impacted the semiconductor manufacturing industry. His work continues to pave the way for advancements in reliable and efficient polishing processes.