Horst Schafer

Title: Horst Schafer: Innovator in Semiconductor Technology

Introduction

Horst Schafer is a notable inventor based in Hannoversch Munden, Germany. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of polycrystalline semiconductor resistance layers. With a total of 2 patents to his name, Schafer's work has had a lasting impact on the industry.

Latest Patents

Schafer's latest patents include a method of manufacturing a polycrystalline semiconductor resistance layer and a silicon pressure sensor featuring such a resistance layer. The first patent describes a process where an insulating layer is formed on a silicon body, followed by the deposition of a polycrystalline silicon layer. A second polycrystalline silicon layer, with a coarser crystallite structure, is then applied. Both layers are additionally doped to enhance their properties. The second patent focuses on the silicon pressure sensor that utilizes this innovative resistance layer, showcasing the practical applications of his research.

Career Highlights

Horst Schafer is currently associated with U.S. Philips Corporation, where he continues to advance semiconductor technologies. His work has been instrumental in developing methods that improve the efficiency and functionality of semiconductor devices.

Collaborations

Schafer has collaborated with notable colleagues such as Volker Graeger and Rolf U Kobs. Their combined expertise has contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

Horst Schafer's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in the field, making him a significant figure in the world of inventions.