Dorsten, Germany

Horst Ehrich


Average Co-Inventor Count = 2.1

ph-index = 7

Forward Citations = 268(Granted Patents)


Company Filing History:


Years Active: 1992-2004

Loading Chart...
12 patents (USPTO):Explore Patents

Title: Horst Ehrich: Innovator in Multilayer Polymer Technology

Introduction

Horst Ehrich is a distinguished inventor based in Dorsten, Germany, known for his significant contributions to the field of polymer technology. With a total of 12 patents to his name, he has made remarkable advancements in enhancing gas and vapor barrier properties in multilayer structures.

Latest Patents

One of his latest patents is titled "Multilayer polymeric/zero valent material structure for enhanced gas or vapor barrier and UV barrier and method for making same." This innovative patent describes a coated multilayer structure that includes a polymeric base layer, a zero valent material barrier layer, and a top coat. The top coat comprises a soluble compound that effectively reduces the permeability of the multilayer structure to gas or vapor. Additionally, the zero valent material barrier layer enhances the barrier against UV light. The patent also discloses methods for improving the gas or vapor barrier properties and recycling containers coated with a zero valent material barrier layer.

Career Highlights

Throughout his career, Horst Ehrich has worked with notable companies, including The Coca-Cola Company and Plasco Dr. Ehrich Plasma-Coating GmbH. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in packaging technology.

Collaborations

Horst has collaborated with several professionals in his field, including George Plester and Mark Rule. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Horst Ehrich's work in multilayer polymer technology has significantly impacted the industry, particularly in enhancing barrier properties for various applications. His innovative patents and collaborations highlight his dedication to advancing technology in this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…