The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 1992
Filed:
Feb. 16, 1990
Horst Ehrich, Dorsten, DE;
Plasco Dr. Ehrich Plasma - Coating GmbH, Heidesheim, DE;
Abstract
A method for evaporating materials in a vacuum chamber by heating a material to be evaporated by the impact of electrons generated in a vacuum arc discharge ignited and sustained between a cold cathode and an anode, comprises the steps of locating the cathode and the anode in a vacuum chamber, connecting the material to be evaporated to at least a part of the anode in the evaporation chamber, generating electrons for a self-sustained discharge in the cathode spots on the cold cathode-surface, bombarding the anode with electrons generated in the arc discharge to obtain on the surface of the anode a power input sufficient for the evaporation of the material, and maintaining the arc discharge essentially in the vapor of the material evaporated at the anode. An apparatus for performing the method includes a vacuum evaporation chamber, in which the cold cathode and the anode, both provided with cooling means are positioned opposite to each other and the material to be evaporated is provided at the end of the anode, facing the cathode.