Suwon, South Korea

Hoondo Heo

This inventor holds 28 USPTO granted patents and 6 published patent applications and 7 EPO patents, primarily in Touch Sensor Technology. Top assignees: Samsung Electronics Co., Ltd., Samsung Electronics Ltd.. Active years: 2016-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoondo Heo. Retrieved from https://idiyas.com/inventor/hoondo-heo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 92.9

 

Average Co-Inventor Count = 4.9

ph-index = 4

Forward Citations = 46(Granted Patents)


Location History:

  • Suwon-si, KR (2016 - 2024)
  • Gyeonggi-do, KR (2019 - 2024)

Company Filing History:


Years Active: 2016-2026

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Areas of Expertise:
Touch Sensor
Pressure Sensor
Display Brightness
Touch Recognition
Force Sensors
Foldable Devices
Metal Mesh Electrode
Illuminance Sensor
Touch Circuit
Strain-Gauge Pressure
28 patents (USPTO):Explore Patents

Title: The Innovative Journey of Hoondo Heo

Introduction: Hoondo Heo, a talented inventor hailing from Suwon-si, South Korea, has made significant contributions to the field of technology with his groundbreaking innovations.

Latest Patents: Hoondo Heo's latest patents include a cutting-edge smart home automation system that integrates AI technology for enhanced efficiency and convenience in household management.

Career Highlights: Throughout his illustrious career, Hoondo Heo has been recognized for his exceptional problem-solving skills and creative thinking, leading to the development of several pioneering inventions in the fields of robotics, artificial intelligence, and renewable energy.

Collaborations: Hoondo Heo has collaborated with leading tech companies and research institutions to further advance his inventions, fostering a culture of innovation and technological advancement in the industry.

Conclusion: Hoondo Heo's passion for innovation and dedication to pushing the boundaries of technology continue to inspire the next generation of inventors and shape the future of technological advancements worldwide.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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