This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Other. Active years: 2018.
Company Filing History:
1 out of 834,411 Years Active: 2018
Title: Innovations of Hongxia Zhang in Atomic Layer Deposition
Introduction
Hongxia Zhang is an accomplished inventor based in Albuquerque, NM (US). He has made significant contributions to the field of atomic layer deposition, particularly in the development of methods and apparatuses that enhance the efficiency of this process. His innovative approach has the potential to impact various industries that rely on fine powders.
Latest Patents
Hongxia Zhang holds 1 patent for his invention titled "Apparatus and method for making atomic layer deposition on fine powders." This patent describes a method and apparatus for making atomic layer deposition on powdered materials. The invention features a rotary vessel with a tilted rotation axis that can serve as the deposition chamber. The rotary vessel can be utilized directly as the deposition chamber or positioned inside a vacuum chamber that functions as the deposition chamber. A hollow shaft is employed to deliver rotary motion and facilitate pumping. Additionally, a tube can be inserted into the hollow shaft or the rotary vessel to introduce precursors. The design incorporates a gas diffuser and a gradually increased pumping speed to minimize agitation caused by gas flow. Intermittent rotation, variable rotary speed, and extruding structures on the inner surface of the rotary vessel are also included to enhance powder agitation.
Career Highlights
Throughout his career, Hongxia Zhang has focused on advancing the technology surrounding atomic layer deposition. His innovative methods have garnered attention for their potential applications in various fields, including materials science and nanotechnology. His work exemplifies the intersection of creativity and technical expertise.
Collaborations
Hongxia Zhang collaborates with Ying-Bing Jiang, who is also involved in research and development in related fields. Their partnership highlights the importance of teamwork in driving innovation and achieving breakthroughs in technology.
Conclusion
Hongxia Zhang's contributions to atomic layer deposition demonstrate his commitment to innovation and excellence in his field. His patent reflects a significant advancement in the methodology of working with fine powders, showcasing the potential for future applications.