Shenzhen, China

Hongwei Geng

This inventor holds 1 USPTO granted patent. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongwei Geng. Retrieved from https://idiyas.com/inventor/hongwei-geng-10mctkaq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: The Innovative Journey of Hongwei Geng

Hongwei Geng is a notable inventor based in Shenzhen, China. He has made significant contributions to the field of technology, particularly with his innovative designs and inventions. His work has garnered attention in the industry, showcasing his dedication to advancing technology.

Latest Patents

Hongwei Geng holds a patent for a laser engraving machine. This invention highlights his expertise in creating efficient and effective tools for various applications. The laser engraving machine is designed to enhance precision and speed in engraving tasks, making it a valuable asset in manufacturing and design.

Career Highlights

Throughout his career, Hongwei Geng has demonstrated a commitment to innovation. His work on the laser engraving machine is a testament to his skills and vision. He has continually sought to improve existing technologies and develop new solutions that meet the needs of modern industries.

Collaborations

Hongwei Geng has collaborated with talented individuals such as Qichuan Xu and Guihua He. These partnerships have allowed him to expand his knowledge and enhance his inventions. Working alongside skilled professionals has contributed to the success of his projects.

Conclusion

In summary, Hongwei Geng is an accomplished inventor whose work in laser engraving technology has made a significant impact. His collaborations and innovative spirit continue to drive advancements in the field. The future looks promising for Geng as he continues to explore new horizons in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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