Hongrui Guo

Title: Hongrui Guo: Innovator in Physical Vapor Deposition Technology

Introduction

Hongrui Guo is a prominent inventor based in Beijing, China. He has made significant contributions to the field of microelectronics through his innovative designs and patents. His work primarily focuses on physical vapor deposition (PVD) technology, which is essential for various applications in semiconductor manufacturing.

Latest Patents

Hongrui Guo holds a patent for a physical vapor deposition chamber and apparatus. This patent describes a PVD chamber that includes a chamber body with an upper electrode assembly. The assembly features a base plate assembly for carrying a magnetron, a backplate arranged at an interval with the base plate assembly, and a connection assembly that links the two components. The design allows for the adjustment of the interval between the base plate assembly and the backplate, enabling the size of the target magnetic gap to be conveniently modified according to specific requirements or conditions. This innovation enhances the efficiency and flexibility of PVD processes.

Career Highlights

Hongrui Guo is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His role at the company involves developing advanced microelectronic equipment and technologies. His expertise in PVD technology has positioned him as a key player in the industry, contributing to the advancement of semiconductor manufacturing processes.

Collaborations

Hongrui Guo has collaborated with notable colleagues in his field, including Bing Li and Qiwei Huang. These partnerships have fostered innovation and the sharing of ideas, further enhancing the development of cutting-edge technologies in microelectronics.

Conclusion

Hongrui Guo's contributions to physical vapor deposition technology exemplify his commitment to innovation in the microelectronics sector. His patent and work at Beijing Naura Microelectronics Equipment Co., Ltd. highlight his role as a leading inventor in this critical field.