San Jose, CA, United States of America

Hongquing Shan


Average Co-Inventor Count = 13.0

ph-index = 4

Forward Citations = 652(Granted Patents)


Company Filing History:


Years Active: 2002-2007

where 'Filed Patents' based on already Granted Patents

4 patents (USPTO):

Title: Innovations by Inventor Hongquing Shan

Introduction: Hongquing Shan, a prominent inventor based in San Jose, CA, has significantly contributed to the field of semiconductor technology. With a total of four patents to his name, he is known for his innovative techniques in the deposition and etching of dielectric layers, which are crucial for creating efficient semiconductor devices.

Latest Patents: One of Hongquing Shan's latest patents focuses on "Integrated low k dielectrics and etch stops." This patent details a method of depositing and etching dielectric layers with low dielectric constants, allowing for the formation of horizontal interconnects with varying etch rates. It discusses how the concentration of carbon or hydrogen in the dielectric layer can be adjusted through changes in deposition conditions. This innovation aims to enable low k dielectric layers to replace traditional etch stop layers or conventional dielectric in damascene applications. Moreover, the dual damascene structure described involves depositing dielectric layers with constants lower than 4 in a single reactor, promoting efficiency in the etching process for both vertical and horizontal interconnects.

Career Highlights: Hongquing Shan is affiliated with Applied Materials, Inc., a leader in materials engineering solutions for the semiconductor industry. His work is characterized by a commitment to advancing the technology that defines modern electronic devices, ensuring high performance and reliability.

Collaborations: Throughout his career, Shan has collaborated with notable coworkers such as Claes H Bjorkman and David Wingto Cheung. These collaborations have likely played a crucial role in refining his inventions and expanding the impact of his patents in the semiconductor sector.

Conclusion: Hongquing Shan's contribution to semiconductor innovations through his patents on integrated low k dielectrics and etch stops showcases his expertise and commitment to enhancing electronic technology. His work at Applied Materials, Inc., along with his collaborations, highlights the importance of teamwork and innovation in advancing the field of electronics. As the industry continues to evolve, innovators like Shan play a pivotal role in shaping its future.

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