Shanghai, China

Hongmei You

This inventor holds 2 USPTO granted patents. Top assignee: Tongji University. Active years: 2016.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: Innovations of Hongmei You

Introduction

Hongmei You is a prominent inventor based in Shanghai, China. She has made significant contributions to the field of dendrimer chemistry, particularly in the development of phosphonic acid terminated dendrimers. With a total of two patents to her name, her work focuses on innovative solutions for water treatment applications.

Latest Patents

Hongmei You's latest patents include the "Pentaerythritol core, phosphonic acid terminated dendrimer and its preparation method." This invention outlines a method for creating a dendrimer that exhibits high calcium tolerance and excellent inhibiting efficiency of calcium carbonate, calcium sulfate, and barium sulfate. This technology is particularly useful in industrial water systems, including circulating cooling water and oilfield flooding.

Another notable patent is the "Trimethylolpropane core, phosphonic acid terminated dendrimer and its preparation method." Similar to her previous work, this invention also focuses on a dendrimer with high calcium tolerance and effective inhibition of scale formation in water treatment processes.

Career Highlights

Hongmei You is affiliated with Tongji University, where she continues to advance her research in dendrimer technology. Her academic background and innovative research have positioned her as a key figure in her field.

Collaborations

Hongmei collaborates with esteemed colleagues, including Bingru Zhang and Fengting Li, who contribute to her research endeavors.

Conclusion

Hongmei You's innovative work in dendrimer chemistry has the potential to significantly impact water treatment technologies. Her patents reflect her commitment to addressing critical challenges in industrial applications.

Profile summary based on public USPTO records.
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