Gyeonggi-do, South Korea

Hongku Lee

This inventor holds 1 USPTO granted patent. Top assignee: Hctm Co., Ltd.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongku Lee. Retrieved from https://idiyas.com/inventor/hongku-lee-vig7jhw4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hongku Lee

Introduction

Hongku Lee is a notable inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of particle measurement technology. His innovative approach has led to the development of a unique particle measuring system that enhances measurement accuracy and convenience.

Latest Patents

Hongku Lee holds 1 patent for his invention of a particle measuring system. This system includes two drying units, where one unit is designed to dry fine particles, while the other regenerates a dehumidifying agent. The regeneration process allows the dehumidifying agent to be used semi-permanently, eliminating the need for frequent replacements. This innovation not only improves the continuity of measurements but also enhances the accuracy of the results.

Career Highlights

Hongku Lee is associated with Hctm Co., Ltd., where he continues to work on advancing particle measurement technologies. His dedication to innovation has positioned him as a key figure in his field.

Collaborations

He collaborates with talented coworkers, including Cheolhong Kim and Jeongsuk Choi, who contribute to the development of cutting-edge technologies in their projects.

Conclusion

Hongku Lee's contributions to particle measurement technology exemplify the impact of innovative thinking in engineering. His work continues to influence the industry and improve measurement systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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