Shanghai, China

Hongjun Ma

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Dow Silicones Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hongjun Ma. Retrieved from https://idiyas.com/inventor/hongjun-ma-n0d5ytby

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Hongjun Ma

Introduction

Hongjun Ma is a notable inventor based in Shanghai, China. He has made significant contributions to the field of organopolysiloxane production. His innovative methods have implications for various applications, particularly in surface modification.

Latest Patents

Hongjun Ma holds a patent for a "Method for producing organopolysiloxane." This method involves several steps: treating an organopolysiloxane with an alkali salt of carboxylic acid, removing the alkali salt, and reacting the organopolysiloxane with an alkenyl group-containing alkoxysilane in the presence of a platinum-based catalyst. This process allows for the production of organopolysiloxane without hydrolyzing any alkoxysilylalkyl groups, making it useful as a surface modifier for various types of fillers. He has 1 patent to his name.

Career Highlights

Hongjun Ma is currently employed at Dow Silicones Corporation, where he continues to develop innovative solutions in the field of silicones. His work has been instrumental in advancing the technology related to organopolysiloxanes.

Collaborations

He collaborates with talented coworkers, including Peng Li and Xiaocong Xu, who contribute to the innovative environment at Dow Silicones Corporation.

Conclusion

Hongjun Ma's contributions to the field of organopolysiloxane production highlight his role as an influential inventor. His innovative methods and collaborations continue to drive advancements in this important area of research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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