Suwon, South Korea

Hong Yeom Kim

This inventor holds 1 USPTO granted patent. Top assignee: Nextchip Co., Ltd.. Active years: 2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hong Yeom Kim. Retrieved from https://idiyas.com/inventor/hong-yeom-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Hong Yeom Kim

Introduction

Hong Yeom Kim is an accomplished inventor based in Suwon-si, South Korea. He has made significant contributions to the field of image recovery technology. His innovative work focuses on developing methods to restore images that have been damaged by adverse weather conditions.

Latest Patents

One of his notable patents is titled "Apparatus and method for recovering images damaged by weather phenomena." This invention includes an input unit for receiving an image, a damaged image detection unit for identifying images affected by weather phenomena, an image recovery unit for restoring the damaged image, and an output unit for displaying the recovered image. The recovery unit is capable of enhancing the contrast and/or color of the damaged image, showcasing Kim's commitment to improving image quality.

Career Highlights

Hong Yeom Kim is currently employed at Nextchip Co., Ltd., where he continues to innovate and develop new technologies. His work at the company has positioned him as a key player in the field of image processing and recovery.

Collaborations

He collaborates with Kyoung Ho Lee, contributing to advancements in their shared field of expertise.

Conclusion

Hong Yeom Kim's innovative approach to image recovery demonstrates his dedication to enhancing technology in challenging conditions. His contributions are valuable to the industry and highlight the importance of innovation in improving image quality.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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