Osaka, Japan

Hong-Xing Wang


Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2010-2013

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Hong-Xing Wang

Introduction

Hong-Xing Wang, an accomplished inventor based in Osaka, Japan, has made significant contributions to the field of carbon film technologies. With three patents to his name, Wang's innovations focus on enhancing current voltage characteristics and field emission capabilities through advanced carbon film structures.

Latest Patents

Wang's latest patents include groundbreaking advancements in carbon film technology. The first patent describes a carbon film and carbon film structure that achieves remarkable improvements in current voltage (IV) characteristics. This innovative design comprises two or more carbon film assembly units formed on a substrate. The structure includes a stem-like carbon film resembling a long needle and a branch-like carbon film cluster enveloping the stem from its halfway point to the lower section. Notably, the stem features a configuration with a spiral streak-like step part at the tip, with a gradually decreasing radius towards the end.

The second patent revolves around a carbon film specifically shaped for field emission purposes. It adopts an elongated needle shape where the radius diminishes towards the tip, optimizing the film for enhanced field concentration. The field concentration coefficient, expressed in the Fowler-Nordheim equation as h/r, represents the radius at different positions along the film, demonstrating Wang's meticulous attention to design and functionality.

Career Highlights

Throughout his career, Hong-Xing Wang has worked with reputed organizations, enriching his expertise and fostering innovation. Notable among these institutions are Pureron Japan Co., Ltd. and the Life Technology Research Institute, Inc. His experiences in these companies have likely played a crucial role in shaping his inventive approach.

Collaborations

Collaboration has been a key aspect of Wang's success. He has worked alongside esteemed colleagues such as Akio Hiraki and Masanori Haba, enabling the exchange of ideas and strategies essential for innovative development in the field of carbon film technologies.

Conclusion

Hong-Xing Wang exemplifies the spirit of innovation through his patent achievements and collaborative efforts. His dedication to enhancing carbon film technology ensures that his contributions will significantly influence advancements in various applications, paving the way for future breakthroughs in this important area of research.

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