Company Filing History:
Years Active: 2017-2021
Title: Innovations of Hong Xie in Graphene Technology
Introduction
Hong Xie is a prominent inventor based in Shanghai, China, known for his significant contributions to the field of graphene technology. With a total of 3 patents, he has developed innovative methods that enhance the production and application of graphene materials.
Latest Patents
One of his latest patents is titled "Method for adjusting and controlling boundary of graphene." This invention involves a process that allows for the adjustment and control of the boundary of graphene by providing an insulating substrate in a growth chamber. The method includes feeding a first reaction gas, which comprises a carbon source gas, and controlling its flow rate to form a graphene structure with a specific boundary shape. This invention enables the controllability of the graphene boundary by adjusting the ratio of carbon source gas to catalytic gas during the growth process.
Another notable patent is the "Growth method of graphene." This method outlines steps that include providing an insulating substrate, heating it to a preset temperature, and introducing a gas containing a catalytic element into the growth chamber. By feeding carbon source into the chamber, a high-quality graphene thin film is grown on the substrate. This approach improves production yield and reduces growth costs, facilitating mass production of graphene, which can be applied in various fields such as novel graphene electronic devices and transparent conducting films.
Career Highlights
Hong Xie is affiliated with the Chinese Academy of Sciences, where he conducts research and development in advanced materials. His work has significantly impacted the field of nanotechnology, particularly in the synthesis and application of graphene.
Collaborations
He collaborates with esteemed colleagues, including Haomin Wang and Xiaoming Xie, to further advance research in graphene technologies.
Conclusion
Hong Xie's innovative work in graphene technology showcases his expertise and commitment to advancing material science. His patents reflect a deep understanding of the complexities involved in graphene production and its potential applications.