Yongin, South Korea

Hong Won Lee

This inventor holds 1 USPTO granted patent. Top assignee: Ligadp Co., Ltd.. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hong Won Lee. Retrieved from https://idiyas.com/inventor/hong-won-lee-0r0uy075

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: Innovations of Hong Won Lee in Chemical Vapor Deposition

Introduction

Hong Won Lee is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of chemical vapor deposition through his innovative patent. His work focuses on improving temperature control methods, which are crucial for the efficiency and effectiveness of chemical vapor deposition processes.

Latest Patents

Hong Won Lee holds a patent for a "Temperature control method for chemical vapor deposition apparatus." This invention provides a method to accurately grasp the temperature difference between a susceptor's surface and a substrate's surface without the need for complicated and expensive equipment. The method involves detecting the rotation state of the susceptor, measuring its top surface temperature, calculating the temperature distribution based on these measurements, and controlling the temperature accordingly.

Career Highlights

Hong Won Lee is associated with Ligadp Co., Ltd., where he applies his expertise in chemical vapor deposition technologies. His innovative approach has positioned him as a valuable asset in his field, contributing to advancements in manufacturing processes.

Collaborations

Some of his coworkers include Sung Jae Hong and Seok Man Han, who collaborate with him on various projects within the company. Their teamwork enhances the development of innovative solutions in their industry.

Conclusion

Hong Won Lee's contributions to the field of chemical vapor deposition through his innovative patent demonstrate his commitment to advancing technology. His work not only improves efficiency but also sets a standard for future developments in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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