This inventor holds 1 USPTO granted patent. Top assignee: National Chung Hsing University. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Innovations of Hong-Ta Yang in Nano-Structures
Introduction: Hong-Ta Yang is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of composites with hollow nano-structures. His innovative work has the potential to impact various applications in electronics and materials engineering.
Latest Patents: Hong-Ta Yang holds a patent for a composite with hollow nano-structures. This composite includes multiple one-dimensional hollow nanowires dispersed into a flexible polymer film. The dielectric constant of the one-dimensional hollow nanowire is lower than that of the polymer film, resulting in a composite with a dielectric constant that lies between the two. This innovation opens up new possibilities for flexible electronic devices.
Career Highlights: Hong-Ta Yang is affiliated with National Chung Hsing University, where he conducts research and develops new technologies. His work is characterized by a focus on enhancing the properties of materials through innovative design and engineering.
Collaborations: Some of his notable coworkers include Tzong-Ming Wu and Fuh-Sheng Shieu, who contribute to the research and development efforts in his field.
Conclusion: Hong-Ta Yang's contributions to the field of nano-structures and composites demonstrate his commitment to advancing technology and innovation. His patent reflects a significant step forward in materials science, showcasing the potential for future applications in various industries.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile