Hong Sheng Yang

Title: Hong Sheng Yang and Real-Time Target-Shorting Detection in Magnetron Sputtering

Introduction

Hong Sheng Yang is an inventor based in Shenzhen, China, associated with Arrayed Materials (China) Co., Ltd. His patent work addresses process monitoring and equipment control for thin-film deposition using magnetron sputtering.

Latest Patents

Yang is named on 1 patent: “Magnetron Sputtering Apparatus and Control Method for Timely Detecting Target Shorting by Monitoring Electrical Resistance Between PVD Target Cathode and Electrical Ground in Real Time.”

The invention describes a magnetron sputtering system with a deposition chamber, a target and target holder, and a pedestal that supports a substrate opposite the target. A magnetron generates a magnetic field to confine electrons and help ignite and maintain plasma. A main power supply applies power to the target, creating an electrical field that works with the magnetic field to convert some of the working gas into plasma and direct ions toward the target. A resistance measurement meter connects the target to an electrical ground point and measures the resistance between them, enabling real-time detection of target shorting.

Career Highlights

Yang’s listed patent reflects work on monitoring and control in physical vapor deposition equipment. By measuring electrical resistance between the target cathode and ground during operation, the disclosed system is designed to identify shorting promptly and support reliable sputtering processes.

Collaborations

The patent information also names Min Luo and Zuoxing Li as Yang’s coworkers. Yang is associated with Arrayed Materials (China) Co., Ltd.

Conclusion

Hong Sheng Yang’s patent focuses on real-time resistance monitoring as a practical way to detect target shorting in magnetron sputtering equipment for thin-film deposition.