Seoul, South Korea

Hong Ryeol Lee

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Sds. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hong Ryeol Lee. Retrieved from https://idiyas.com/inventor/hong-ryeol-lee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Hong Ryeol Lee

Introduction

Hong Ryeol Lee is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of robotics process automation (RPA). His innovative approach has led to the development of a unique method that enhances the efficiency of RPA tasks.

Latest Patents

Hong Ryeol Lee holds a patent for a "Method for recording and executing RPA task." This method involves receiving object information on an object selected by user input within a window region of an external desktop. The process includes adding action information to the specification data of the RPA task using the received object information. This innovation aims to streamline the recording and execution of RPA tasks, making it easier for users to automate processes.

Career Highlights

Hong Ryeol Lee is currently employed at Samsung SDS, a leading company in the field of IT services and solutions. His work at Samsung SDS has allowed him to collaborate with other talented professionals in the industry.

Collaborations

Some of his notable coworkers include Seung Woo Lee and Hyo Young Kim. Their collective expertise contributes to the advancement of technology within their organization.

Conclusion

Hong Ryeol Lee's contributions to robotics process automation exemplify the innovative spirit of modern inventors. His patent reflects a commitment to improving automation processes, showcasing the potential for future advancements in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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