Hong-Chih Chen

Title: Innovations by Hong-Chih Chen

Introduction

Hong-Chih Chen is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor technology. His work focuses on developing innovative semiconductor device structures and methods.

Latest Patents

Hong-Chih Chen holds a patent for a semiconductor device structure and methods of forming the same. This patent describes a semiconductor device structure that includes a first source/drain (S/D) region disposed over a substrate, a second S/D region also disposed over the substrate, and a dielectric wall situated between the two S/D regions. The structure features a first conductive contact that is electrically connected to the first S/D region and a second conductive contact connected to the second S/D region. Additionally, a first dielectric material is in contact with the dielectric wall, extending from a specified level to a second level below the bottom surface of the first conductive contact. This innovative design enhances the performance and reliability of semiconductor devices.

Career Highlights

Hong-Chih Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to advance semiconductor technology. His expertise and innovative approach have made him a valuable asset to the company.

Collaborations

Hong-Chih Chen collaborates with fellow inventor Chun-Sheng Liang, contributing to the development of cutting-edge semiconductor technologies.

Conclusion

Hong-Chih Chen's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence advancements in semiconductor device structures.