Hon Siu Shin

Title: Hon Siu Shin: Innovator in Thermal Cycling Technologies

Introduction

Hon Siu Shin is an accomplished inventor based in Singapore, renowned for his contributions to thermal cycling technologies. With a remarkable portfolio of 12 patents, Hon has made significant advancements in thermal uniformity that are critical for various scientific applications.

Latest Patents

Among his latest innovations, Hon has developed an apparatus and methods for providing thermocycler thermal uniformity. This involves a thermal block assembly that includes a sample block and two or more thermoelectric devices. The sample block is designed to accommodate multiple reaction vessels, featuring a top surface that ensures optimal performance. Each thermoelectric device is meticulously engineered to include a housing for a thermal sensor and a thermal control interface linked to a controller, allowing for independent operation. This design is aimed at achieving a uniformly controlled temperature profile throughout the sample block. Additionally, his work on a thermal cycling apparatus and method further enhances temperature uniformity during thermal cycling processes, utilizing a thermal diffusivity plate and edge heaters to maintain controlled conditions effectively.

Career Highlights

Throughout his career, Hon Siu Shin has significantly impacted the field by working with notable companies such as Applied Biosystems, LLC and Applera Corporation. His expertise has driven advancements in biotechnological applications, establishing him as a key player in the innovation landscape.

Collaborations

Hon has collaborated with talented individuals such as Jew Kwee Ngui and Hock Lai Khoo, contributing to the development of advanced thermal cycling technologies. These partnerships underscore the collaborative spirit that fuels innovation in the scientific community.

Conclusion

Hon Siu Shin exemplifies the dedication and ingenuity required for impactful inventions in the realm of thermal cycling. His ongoing contributions through his patents not only reflect his expertise but also pave the way for future advancements in thermal uniformity and related technologies. His work continues to inspire future innovations in the field.