Company Filing History:
Years Active: 2016
Title: Homi Fatemi: Innovator in Semiconductor Metallization
Introduction
Homi Fatemi is a notable inventor based in Milpitas, CA (US). She has made significant contributions to the field of semiconductor processing, particularly in the area of metallization techniques. Her innovative approach has led to advancements that enhance productivity in semiconductor manufacturing.
Latest Patents
Homi Fatemi holds a patent for "High productivity spray processing for the metallization of semiconductor workpieces." This patent describes processing equipment designed for the metallization of multiple semiconductor workpieces. The invention features a controlled atmospheric non-oxidizing gas region that includes at least two enclosed deposition zones, effectively isolating the semiconductor workpieces from external oxidizing environments. A temperature controller is integrated to adjust the temperature of the workpieces within these zones. Each enclosed deposition zone is equipped with at least one spray gun for the metallization process. Additionally, a transport system is utilized to move the semiconductor workpieces through the controlled atmospheric region, which also includes a gas-based pre-cleaning zone. Homi Fatemi's innovative design aims to improve the efficiency and effectiveness of semiconductor metallization.
Career Highlights
Homi Fatemi has been associated with Solexel, Inc., where she has played a crucial role in advancing semiconductor technologies. Her work has been instrumental in developing processes that enhance the quality and efficiency of semiconductor manufacturing.
Collaborations
Homi has collaborated with notable colleagues, including Karl-Josef Kramer and Jay Ashjaee, contributing to a dynamic team focused on innovation in semiconductor technology.
Conclusion
Homi Fatemi's contributions to semiconductor metallization through her innovative patent and work at Solexel, Inc. highlight her role as a key figure in advancing technology in this critical field. Her efforts continue to influence the future of semiconductor manufacturing.