The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2016
Filed:
Dec. 23, 2012
Solexel, Inc., Milpitas, CA (US);
Karl-Josef Kramer, San Jose, CA (US);
Jay Ashjaee, Los Gatos, CA (US);
Mehrdad M. Moslehi, Los Altos, CA (US);
Anthony Calcaterra, Milpitas, CA (US);
David Dutton, Milpitas, CA (US);
Pawan Kapur, Palo alto, CA (US);
Sean Seutter, San Jose, CA (US);
Homi Fatemi, Milpitas, CA (US);
Solexel, Inc., Milpitas, CA (US);
Abstract
Processing equipment for the metallization of a plurality of semiconductor workpieces. A controlled atmospheric non-oxidizing gas region comprises at least two enclosed deposition zones, the controlled atmospheric non-oxidizing gas region is isolated from external oxidizing ambient. A temperature controller adjusts the temperature of the semiconductor workpiece in each of the at least two enclosed deposition zones. Each of the enclosed deposition zones comprising at least one spray gun for the metallization of the semiconductor workpiece. A transport system moves the semiconductor workpiece through the controlled atmospheric non-oxidizing gas region. A batch carrier plate carries the semiconductor workpiece through the controlled atmospheric non-oxidizing gas region. The controlled atmospheric non-oxidizing gas region further comprises a gas-based pre-cleaning zone.