Homgqing Shan

Title: Innovations of Homgqing Shan in Plasma Processing Technology

Introduction

Homgqing Shan is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of plasma processing technology. With a total of three patents to his name, Shan's work focuses on enhancing the efficiency and effectiveness of substrate vacuum processing chambers.

Latest Patents

One of Shan's latest patents is for a double slit-valve door apparatus designed for plasma processing. This innovative solution introduces a second inner slit passage door that supplements the normal slit valve outside the chamber. The inner slit passage door effectively blocks the slit passage at or near the substrate processing location, preventing process byproducts from depositing on the inner surfaces beyond the door. This design improves plasma uniformity in the processing chamber by eliminating a large cavity adjacent to the substrate processing location, which would otherwise allow plasma to expand uncontrollably. Furthermore, the inner slit passage door is engineered to avoid generating particles during its opening and closing motion, as it does not rub against any chamber elements. The door is strategically positioned with a predetermined gap from adjacent components, and its beveled surfaces further minimize the risk of particle generation, even in the presence of process byproducts.

Career Highlights

Homgqing Shan is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to develop and refine technologies that are crucial for modern manufacturing processes.

Collaborations

Shan collaborates with esteemed colleagues such as Michael D Welch and Paul E Luscher, contributing to a dynamic team focused on advancing plasma processing technologies.

Conclusion

Homgqing Shan's innovative contributions to plasma processing technology demonstrate his commitment to improving manufacturing efficiency. His patents reflect a deep understanding of the challenges in the field and provide practical solutions that enhance the performance of processing chambers.