Colchester, VT, United States of America

Holly H Magoon


Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovations of Holly H. Magoon

Introduction

Holly H. Magoon is a notable inventor based in Colchester, Vermont. She has made significant contributions to the field of lithographic processing through her innovative patent. With a focus on improving measurement techniques, her work has implications for the accuracy and efficiency of semiconductor manufacturing.

Latest Patents

Holly H. Magoon holds a patent titled "Methods for critical dimension and focus mapping using critical dimension test marks." This patent describes methods for using critical dimension test marks to rapidly determine the best focus position of lithographic processing equipment. The invention allows for critical dimension measurement analysis across a wafer's surface. In her first embodiment, a plurality of test mark arrays is distributed across the surface of a wafer, with different arrays created at various focus positions. Measurement of the length or area of the resultant test marks enables the determination of the best focus position of the processing equipment. This method allows for the measurement of hundreds of values across a wafer in just thirty minutes, significantly faster than traditional methods that require at least five hours.

Career Highlights

Holly H. Magoon is associated with Nikon Precision Incorporated, where she applies her expertise in lithography and measurement techniques. Her innovative approach has contributed to advancements in the semiconductor industry, enhancing the accuracy and repeatability of critical dimension measurements.

Collaborations

Holly has collaborated with notable colleagues such as Frank C. Leung and Etsuya Morita, further enriching her work and expanding the impact of her innovations.

Conclusion

Holly H. Magoon's contributions to the field of lithographic processing through her patent demonstrate her commitment to innovation and excellence. Her work not only enhances measurement techniques but also plays a crucial role in the advancement of semiconductor manufacturing.

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