Hojoong Kim

Title: Hojoong Kim - Innovator in Chemical Mechanical Polishing Technology

Introduction

Hojoong Kim is a notable inventor based in Yongin-si, South Korea. He has made significant contributions to the field of chemical mechanical polishing (CMP) technology. His innovative work has led to the development of a unique CMP apparatus and pad, which are essential in the semiconductor manufacturing process.

Latest Patents

Hojoong Kim holds a patent for a chemical mechanical polishing pad and a chemical mechanical polishing apparatus that includes the same. The patent describes a CMP apparatus featuring a rotating plate, a CMP pad positioned on the upper surface of the rotating plate, and a rotating body that brings a wafer into contact with the CMP pad. This apparatus is designed to press the wafer while a slurry supply delivers slurry to the CMP pad. The CMP pad itself consists of a circular plate-shaped body with multiple circular grooves on its bottom surface, along with a connection groove that links these circular grooves.

Career Highlights

Throughout his career, Hojoong Kim has worked with prominent organizations, including Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to refine his expertise in CMP technology and contribute to advancements in the field.

Collaborations

Hojoong Kim has collaborated with talented individuals such as Taesung Kim and Seokjun Hong. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Hojoong Kim's contributions to chemical mechanical polishing technology highlight his role as an influential inventor in the semiconductor industry. His innovative patent and collaborations with esteemed colleagues underscore his commitment to advancing technology in this critical field.