Seoul, South Korea

Hojeong Cha

This inventor holds 1 USPTO granted patent. Top assignee: Afs Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hojeong Cha. Retrieved from https://idiyas.com/inventor/hojeong-cha

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hojeong Cha and Hair Self-Diagnosis Technology.

Introduction

Hojeong Cha is an inventor based in Seoul, South Korea. His work includes a patent for technology designed to improve the accuracy of hair self-diagnosis and support personalized hairline assessment.

Latest Patents

Cha’s listed patent is “Method for Executing Application Having Improved Self-Diagnosis Accuracy for Hair, and Self-Diagnosis Service Device for Hair by Using Same.” The invention uses two-dimensional images of a user’s hair to derive virtual stereoscopic information, helping identify the depth of the head and hairline characteristics. It can recommend a hairline suited to the user’s hairline and overall facial shape, estimate hair density near the forehead, and calculate the approximate number of hairs needed for a selected hairline. The system is intended to make self-diagnosis more accurate and help users assess the potential need for hair transplantation. Cha is listed with 1 patent.

Career Highlights

Cha is associated with AFS Inc. His patented work applies image analysis and automated estimation to a consumer-facing hair assessment service.

Collaborations

Taehee Kim and Hojong Lee are identified as Cha’s coworkers. The available information does not specify their roles in the patent or the extent of their collaboration.

Conclusion

Hojeong Cha’s patent focuses on using image-based analysis to provide more personalized and accurate hairline and hair-density assessments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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