Seoul, South Korea

Hobum Park

This inventor holds 1 USPTO granted patent. Top assignee: Lg Chem, Ltd. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Hobum Park in Separation Membrane Technology

Introduction

Hobum Park is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of separation membrane technology. His innovative work focuses on enhancing the performance and durability of separation membranes.

Latest Patents

Hobum Park holds a patent for a surface-modified separation membrane and a method for modifying the surface of a separation membrane. This invention includes a separation membrane with a coating layer designed to improve contamination resistance and chemical resistance. The coating layer is implemented with a nanoscale thickness to maintain permeation flux before and after coating. The coating comprises dopamine, which provides stable adsorption to the separation membrane, and a hydrophilic material that enhances the membrane's durability and protects it from hydrophobic contaminants.

Career Highlights

Hobum Park is currently employed at LG Chem, Ltd., where he continues to develop innovative solutions in membrane technology. His work has garnered attention for its practical applications in various industries, particularly in water treatment and filtration processes.

Collaborations

Hobum Park collaborates with talented colleagues, including Changho Lee and Hyowon Kim. Their combined expertise contributes to the advancement of membrane technology and the successful implementation of innovative solutions.

Conclusion

Hobum Park's contributions to the field of separation membranes demonstrate his commitment to innovation and excellence. His patented technology has the potential to significantly impact various applications, enhancing the efficiency and effectiveness of separation processes.

Profile summary based on public USPTO records.
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