Longmont, CO, United States of America

Hoatian Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Marvell International Limited. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hoatian Zhang. Retrieved from https://idiyas.com/inventor/hoatian-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Hoatian Zhang - Innovator in Signal Processing Technology

Introduction

Hoatian Zhang is a notable inventor based in Longmont, Colorado. He has made significant contributions to the field of signal processing, particularly with his innovative patent that addresses high frequency amplitude modulation distortion. His work is instrumental in enhancing the quality of signal processing technologies.

Latest Patents

Hoatian Zhang holds a patent for a "Detector for high frequency amplitude modulation distortion." This invention involves a method in a signal processor that includes equalizing a signal corresponding to data read from a storage medium. The process generates an equalized signal, determines its signal level, and compares it to an expected signal level. After adjusting the amplitude of the equalized signal based on this comparison, the signal is decoded, improving the overall performance of signal processing systems. He has 1 patent to his name.

Career Highlights

Hoatian Zhang is currently employed at Marvell International Limited, where he continues to develop innovative solutions in signal processing. His expertise and dedication to his work have made him a valuable asset to the company.

Collaborations

Hoatian collaborates with Jingfeng Liu, a fellow innovator, to further advance their research and development efforts in the field of signal processing.

Conclusion

Hoatian Zhang's contributions to signal processing technology through his patent demonstrate his commitment to innovation and excellence. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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