Hsinchu, Taiwan

Ho-Yen Hsiao

This inventor holds 1 USPTO granted patent. Top assignee: Precision Instrument Development Center National Science Council. Active years: 2002.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho-Yen Hsiao. Retrieved from https://idiyas.com/inventor/ho-yen-hsiao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2002

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Ho-Yen Hsiao

Introduction

Ho-Yen Hsiao is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of sputter coating technology. His work focuses on improving the uniformity of coatings through innovative monitoring methods.

Latest Patents

Ho-Yen Hsiao holds a patent for a method titled "Method for in-situ monitoring layer uniformity of sputter coating based on intensity distribution of plasma spectrum." This invention discloses an in-situ monitoring method on the layer uniformity of sputter coatings in a vacuum chamber based on deconvolution of measuring plasma emission spectra. The method begins with an Ar-normalized Sr intensity distribution derived from deconvoluting the plasma spectra using the Abel inversion method. This distribution is considered the spatial representation of the sputtering mass of the source target. The thickness profile on the substrate is then calculated using an n-th power of cosine law model. Observations have shown good agreement between the calculated thickness profile based on spectroscopic measurement and experimental observation. The film uniformity for the same sputter conditions can be monitored by comparing in-situ measurements of Ar-normalized Sr intensity distribution with a standard curve or by directly calculating thickness distribution on the substrates.

Career Highlights

Ho-Yen Hsiao is affiliated with the Precision Instrument Development Center under the National Science Council. His work at this institution has allowed him to focus on advancing technologies related to sputter coatings. His innovative methods have the potential to enhance the quality and consistency of coatings used in various applications.

Collaborations

Some of Ho-Yen Hsiao's coworkers include Cheng-Chung Jaing and Chuen-Horng Tsai. Their collaborative efforts contribute to the ongoing research and development in the field of sputter coating technology.

Conclusion

Ho-Yen Hsiao's contributions to sputter coating technology through his innovative patent demonstrate his commitment to advancing the field. His work not only enhances the understanding of coating uniformity but also paves the way for future innovations in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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