Daegu, South Korea

Ho-Wan Kwak

This inventor holds 1 USPTO granted patent. Top assignee: Kyungpook National University Industry-Academic Cooperation Foundation. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho-Wan Kwak. Retrieved from https://idiyas.com/inventor/ho-wan-kwak

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2016

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1 patent (USPTO):Explore Patents

Title: Ho-Wan Kwak: Innovator in User Recognition Technology

Introduction

Ho-Wan Kwak is a notable inventor based in Daegu, South Korea. He has made significant contributions to the field of user recognition technology. His innovative approach focuses on enhancing user interaction through advanced apparatus and methods.

Latest Patents

Ho-Wan Kwak holds a patent for an "Apparatus and method for enhancing user recognition." This invention includes a storage unit for content, a display unit for showing the stored content, a scan path detection unit for tracking user interaction, an eye feature extraction unit for obtaining eye feature information, and a calculation unit for determining the user's recognition state based on the extracted information. He has 1 patent to his name.

Career Highlights

Kwak is affiliated with the Kyungpook National University Industry-Academic Cooperation Foundation. His work at this institution allows him to bridge the gap between academic research and practical applications in technology.

Collaborations

He collaborates with talented individuals such as Young-Min Jang and Byunghun Hwang, contributing to advancements in user recognition systems.

Conclusion

Ho-Wan Kwak's innovative work in user recognition technology showcases his commitment to enhancing user experiences through advanced methodologies. His contributions are paving the way for future developments in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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