Pyeongtaek-si, South Korea

Ho Sung Lee

This inventor holds 1 USPTO granted patent. Top assignee: Lms, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho Sung Lee. Retrieved from https://idiyas.com/inventor/ho-sung-lee-c7c5a4p7

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: The Innovations of Ho Sung Lee

Introduction

Ho Sung Lee is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of optical technology. His work focuses on enhancing the performance of image capturing devices through innovative optical filters.

Latest Patents

Ho Sung Lee holds a patent for an "Optical filter with a stacking structure and an image capturing device including the same." This invention aims to provide a stacked layer structure that achieves high transmittance of visible light. It is designed to obtain a sharp visible light transmission band while effectively blocking ultraviolet light in the short wavelength region and infrared light in the long wavelength region. Additionally, it prevents flare phenomena, enhancing the quality of captured images.

Career Highlights

Ho Sung Lee is associated with Lms, Inc., where he applies his expertise in optical technologies. His innovative approach has led to advancements in image capturing devices, making them more efficient and reliable.

Collaborations

He has collaborated with notable coworkers, including Tae Jin Song and Joon Ho Jung, contributing to the development of cutting-edge technologies in their field.

Conclusion

Ho Sung Lee's contributions to optical technology and image capturing devices highlight his role as an influential inventor. His patent reflects a commitment to innovation and excellence in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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