Daejeon, South Korea

Ho Soon Yang

This inventor holds 1 USPTO granted patent. Top assignee: Korea Research Institute of Standards and Science. Active years: 2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ho Soon Yang. Retrieved from https://idiyas.com/inventor/ho-soon-yang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2018

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Ho Soon Yang: Innovator in Lateral Shearing Interferometry

Introduction

Ho Soon Yang is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of optical measurement, particularly in the area of lateral shearing interferometry. His innovative work has led to advancements in the accuracy of wavefront measurements.

Latest Patents

Ho Soon Yang holds a patent titled "Correction of rotational inaccuracy in lateral shearing interferometry." This patent provides an operating method for a measuring apparatus that measures the wavefront of a target. The method includes measuring a measurement wavefront based on the target's wavefront, obtaining reference slope information, and calculating rotation angles to correct errors caused by rotation inaccuracies. This innovation enhances the precision of optical measurements.

Career Highlights

Yang is affiliated with the Korea Research Institute of Standards and Science, where he continues to develop and refine his inventions. His work is crucial in improving measurement techniques that are essential for various scientific and industrial applications.

Collaborations

He has collaborated with notable colleagues, including Hyug-gyo Rhee and Young Sik Ghim, contributing to a dynamic research environment that fosters innovation and development.

Conclusion

Ho Soon Yang's contributions to lateral shearing interferometry exemplify the impact of innovative thinking in the field of optical measurement. His patent and ongoing work continue to influence advancements in technology and measurement accuracy.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…