Gunpo-si, South Korea

Ho-sik Shin

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.3

ph-index = 1

Forward Citations = 1(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2017)
  • Gunpo-si, KR (2016 - 2023)

Company Filing History:


Years Active: 2016-2025

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6 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Ho-sik Shin

Introduction

Ho-sik Shin is a prominent inventor based in Gunpo-si, South Korea. He has made significant contributions to the field of display technology, holding a total of 6 patents. His work primarily focuses on enhancing the functionality and efficiency of display devices.

Latest Patents

One of Ho-sik Shin's latest patents involves a display device that includes a display panel and an input sensing layer. The display panel consists of a base layer that features a first island part, a second island part, and a connection part. The sensing patterns of the input sensing layer include a first sensing line pattern that is disposed on both the first island part and the second island part. Additionally, a second sensing line pattern is located on the connection part, which is an area subjected to stress as the display device undergoes shape modifications. Notably, the second sensing line pattern is positioned on an area of the connection part that experiences relatively less stress.

Career Highlights

Ho-sik Shin is currently employed at Samsung Display Co., Ltd., where he continues to innovate and develop advanced display technologies. His expertise and dedication have made him a valuable asset to the company.

Collaborations

Throughout his career, Ho-sik Shin has collaborated with talented individuals such as Byeong-Hee Won and Jun Hyeong Park. These collaborations have further enriched his work and contributed to the success of various projects.

Conclusion

Ho-sik Shin's contributions to display technology are noteworthy, and his innovative patents reflect his commitment to advancing the field. His work at Samsung Display Co., Ltd. and collaborations with esteemed colleagues highlight his significant impact on the industry.

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