Hitoshi Ujimasa

Title: Hitoshi Ujimasa: Innovator in Thin Film Technology

Introduction

Hitoshi Ujimasa is a prominent inventor based in Higashiosaka, Japan. He has made significant contributions to the field of thin film technology, holding a total of 4 patents. His work primarily focuses on advancements in liquid crystal substrates and etching methods for silicon thin films.

Latest Patents

Ujimasa's latest patents include a "Susceptor and surface processing method," which describes a susceptor designed to support a liquid crystal substrate within a vacuum chamber of a thin film deposition apparatus. This innovative susceptor features a stepped portion that is smaller than the substrate, preventing unwanted conduction between films formed at different areas of the substrate. Another notable patent is the "Dry etching method of a silicon thin film," which outlines a selective etching process for a second silicon layer in a multilayer structure. This method utilizes an etching gas that includes freon-14 and either hydrogen chloride or chloride gas, showcasing Ujimasa's expertise in material processing.

Career Highlights

Throughout his career, Hitoshi Ujimasa has worked with notable companies, including Sharp Corporation. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the electronics industry.

Collaborations

Ujimasa has collaborated with esteemed colleagues such as Takehisa Sakurai and Katsuhiro Kawai. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Hitoshi Ujimasa's contributions to thin film technology and his innovative patents reflect his dedication to advancing the field. His work continues to influence the development of electronic materials and processes, solidifying his reputation as a leading inventor in Japan.