Hitoshi Tsuji is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His innovative work has advanced the methods used in lithography and wafer handling.

Latest Patents

One of Tsuji's latest patents is a method of making a negative photoresist image. This method involves exposing a positive resist through a phase shift mask, followed by a baking process in an amine gas atmosphere to make the exposed portion insoluble by developer. The unexposed portion is then subjected to a second exposure using a different mask, allowing for precise lithographic patterns. Another notable patent is for a wafer stage apparatus designed to attract and hold semiconductor wafers. This apparatus features multiple through holes connected to vacuum lines, which are controlled by electromagnetic valves to ensure that warped wafers can be flattened and securely held during processing.

Career Highlights

Hitoshi Tsuji is currently employed at Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to collaborate on various innovative projects that push the boundaries of semiconductor manufacturing.

Collaborations

Tsuji has worked alongside notable colleagues such as Hiroshi Haraguchi and Tiharu Kato. Their combined expertise has contributed to the successful development of advanced technologies in their field.

Conclusion

Hitoshi Tsuji's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of lithography and wafer handling techniques.

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