Ninomiya, Japan

Hitoshi Tanaka


Average Co-Inventor Count = 3.7

ph-index = 2

Forward Citations = 25(Granted Patents)


Location History:

  • Ninomiya, JP (1981)
  • Odawara, JP (1985)

Company Filing History:


Years Active: 1981-1985

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2 patents (USPTO):Explore Patents

Title: Hitoshi Tanaka: Innovator in Phosphor Technology

Introduction

Hitoshi Tanaka is a notable inventor based in Ninomiya, Japan. He has made significant contributions to the field of phosphor technology, holding 2 patents that enhance the performance of phosphors used in various applications.

Latest Patents

Tanaka's latest patents include innovative advancements in phosphor materials. One of his patents describes a phosphor that features a surface treatment composed of silicon dioxide, an aluminum compound, and a zinc compound. This treatment results in a generally spherical or semi-spherical surface, with at least 70% by weight of the surface treating substance being in the form of particles that have an average particle size ranging from 60 to 300 micrometers. Another patent focuses on phosphors specifically designed for color televisions. This phosphor is surface-treated with zinc hydroxide, ensuring that the zinc hydroxide attaches in an amount below 0.7 parts by weight per 100 parts by weight of the phosphor. The phosphor slurries produced from this invention exhibit improved light-exposure sensitivity, leading to phosphor screens that show less color mixing.

Career Highlights

Hitoshi Tanaka is currently associated with Kasei Optonix, Ltd., where he continues to innovate in the field of phosphor technology. His work has been instrumental in advancing the quality and efficiency of phosphor materials used in electronic displays.

Collaborations

Tanaka has collaborated with several talented individuals in his field, including Tomohiro Miyazaki and Goro Matsumoto. These collaborations have contributed to the development of cutting-edge technologies in phosphor applications.

Conclusion

Hitoshi Tanaka's contributions to phosphor technology demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in modern technology.

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