This inventor holds 4 USPTO granted patents. Top assignees: Nittetsu Mining Co., Ltd., Tomy Kogyo Co., Ltd.. Active years: 1988-1997.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1988-1997
Title: Hitoshi Otaka: Innovator in Filter Technology
Introduction
Hitoshi Otaka is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of filter technology, holding a total of 4 patents. His work focuses on developing advanced filters with unique properties, enhancing their functionality and application.
Latest Patents
Otaka's latest patents include a water vapor resistant filter that features chemical resistance and antistatic properties. This innovative filter comprises a permeable molded material, nonwoven fabric, or felt made from polyimide fiber. The design includes a condensed polycyclic polynucleus aromatic resin, a melting fluorine resin, a solvent-soluble cold setting fluorine resin, or a fluorine elastomer. Additionally, he has developed a reinforced filter element that consists of a pair of filter plates made from nonwoven fabric or felt, shaped into a corrugated cross-section. These plates are secured with reinforcements, enhancing the durability and efficiency of the filter.
Career Highlights
Throughout his career, Hitoshi Otaka has worked with prominent companies such as Tomy Kogyo Co., Ltd. and Nittetsu Mining Co., Ltd. His experience in these organizations has contributed to his expertise in filter technology and innovation.
Collaborations
Otaka has collaborated with notable colleagues, including Isao Mitamura and Seihou Taniguchi. These partnerships have fostered a creative environment that has led to the development of groundbreaking filter technologies.
Conclusion
Hitoshi Otaka's contributions to filter technology demonstrate his innovative spirit and dedication to advancing the field. His patents reflect a commitment to creating effective solutions that address specific challenges in filtration.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile