Kawasaki, Japan

Hitoshi Nakatsuhara

This inventor holds 2 USPTO granted patents. Top assignee: Nof Corporation. Active years: 2016-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Nakatsuhara. Retrieved from https://idiyas.com/inventor/hitoshi-nakatsuhara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2016-2018

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2 patents (USPTO):Explore Patents

Title: Hitoshi Nakatsuhara: Innovator in Polyethylene Glycol Derivatives

Introduction

Hitoshi Nakatsuhara is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of polymer chemistry, particularly in the development of multi-arm polyethylene glycol derivatives. With a total of 2 patents to his name, Nakatsuhara continues to push the boundaries of innovation in his field.

Latest Patents

His latest patents include a multi-arm polyethylene glycol derivative and the method for producing the same. This innovative derivative is characterized by a narrow molecular weight distribution and is represented by a specific chemical formula. The invention details the structural components, including various groups and functional elements that enhance its chemical properties.

Career Highlights

Hitoshi Nakatsuhara is currently employed at Nof Corporation, where he applies his expertise in polymer science. His work has been instrumental in advancing the understanding and application of polyethylene glycol derivatives in various industries.

Collaborations

He collaborates with notable colleagues such as Hiroki Yoshioka and Midori Hirai, contributing to a dynamic research environment that fosters innovation and development.

Conclusion

Hitoshi Nakatsuhara's work in the field of polyethylene glycol derivatives exemplifies the spirit of innovation. His contributions continue to impact the industry positively, showcasing the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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