Company Filing History:
Years Active: 1987-1993
Title: Hitoshi Mikami: Innovator in Semiconductor Technology
Introduction
Hitoshi Mikami is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on advancing the efficiency and functionality of semiconductor devices.
Latest Patents
Mikami's latest patents include a "Metal semiconductor device and method for producing the same." This invention involves a metal semiconductor device where an electrode is formed on a semiconductor substrate to create a Schottky junction. The electrode features an oxide film with a first thickness on its upper surface and a non-oxidized portion with a second thickness from the Schottky junction. Additionally, he has developed a method for producing this device, which includes oxidizing a conductor layer on the semiconductor substrate in an oxygen-containing gas and conducting capless annealing in an arsenic atmosphere.
Another notable patent is the "Method of implanting uniform concentrations in solids having." This method pertains to manufacturing a semiconductor device by implanting an impurity in the main plane of a GaAs substrate to simultaneously form multiple regions. The crystal orientation is carefully prescribed to meet specific conditions based on the angles formed during the implantation of silicon ions.
Career Highlights
Mikami is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to push the boundaries of semiconductor innovation and contribute to the company's advancements in this field.
Collaborations
Throughout his career, Mikami has collaborated with notable colleagues, including Katsuyoshi Fukuda and Shigeru Yasuami. These collaborations have further enriched his research and development efforts in semiconductor technology.
Conclusion
Hitoshi Mikami's contributions to semiconductor technology through his patents and work at Toshiba highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of semiconductor devices.