Omuta, Japan

Hitoshi Kajino

This inventor holds 1 USPTO granted patent. Top assignee: Mitsui Kinzoku Company, Limited. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hitoshi Kajino. Retrieved from https://idiyas.com/inventor/hitoshi-kajino-n06fdktz

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Hitoshi Kajino: Innovator in Refractory Materials

Introduction

Hitoshi Kajino is a notable inventor based in Omuta, Japan. He has made significant contributions to the field of refractory materials, particularly through his innovative patent that enhances the performance of graphite-based materials.

Latest Patents

Hitoshi Kajino holds a patent for a refractory member and method of producing the same. This invention provides a refractory member that exhibits excellent corrosion resistance and superior adhesiveness of a carbide coating on a graphite material base. The refractory member consists of a graphite material base and a carbide layer that coats at least part of the surface of the graphite material base. The design includes a composite region where a continuous graphite material phase and a continuous carbide phase alternate, enhancing the material's overall performance.

Career Highlights

Hitoshi Kajino is associated with Mitsui Kinzoku Company, Limited, where he has been instrumental in advancing the company's research and development in refractory materials. His work has contributed to the company's reputation as a leader in innovative material solutions.

Collaborations

Hitoshi Kajino collaborates with Shoji Imaura, leveraging their combined expertise to push the boundaries of refractory material technology.

Conclusion

Hitoshi Kajino's innovative work in refractory materials exemplifies the importance of research and development in enhancing material performance. His contributions continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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